IV族半導体/物質科学関連国際会議
Group IV Semiconductor/Material
Science Related Int. Conference
Symp. G03:
SiGe, Ge, and Related Compounds: Materials, Processing, and
Devices 9,
Pacific Rim Meeting (PRiME 2020) on Electrochem. and Solid-State Sci.,
Oct. 4-9, 2020
Honolulu, Hawaii, USA,
(Web site)
・
8th Int. Symp. on Control of Semiconductor Interfaces
(ISCSI-VIII),
13th Int. WorkShop on New
Group IV Semiconductor Nanoelectronics,
Nov. 27-30, 2019
Tohoku Univ., Sendai, Japan,
(Web site)
・
Symp. G03:
Semiconductor Process Integration 11,
236th Meeting of the
Electrochem. Soc.,
Oct. 13-17, 2019
Atlanta, GA, USA,
(Web site)
・
2nd Joint ISTDM / ICSI 2019 Conf.,
10th Int. SiGe Technology and Device Meeting (ISTDM) and
12th Int. Conf. on Silicon Epitaxy and Heterostructures (ICSI),
Jun. 3-6, 2019
Univ. Wisconsin-Madison, WI, USA,
(Web site)
・
2019 Collaborative Conf. on Materials Research (CCMR
2019),
Jun. 3-7, 2019
Kintex in Goyang Gyeonggi, South Korea,
(Web
site)
・
11th Int. Symp. on Advanced Plasma Sci. and Its
Applications
for Nitrides and Nanomaterials (ISPlasma2019) /
12th Int. Conf. on Plasma-Nano Technol. & Sci.
(IC-PLANTS2019),
Mar. 17-21, 2019
Nagoya Institute of Technology, Nagoya,
Japan,
(Web site)
・
12th Int. WorkShop on New
Group IV Semiconductor Nanoelectronics,
Dec. 6-7, 2018
Sendai, Japan,
(Web site)
・
Symp. G03:
SiGe, Ge, and Related Compounds:
Materials, Processing, and Devices 8,
AiMES 2018, ECS and SMEQ Joint
International Meeting,
Sep. 30-Oct. 4, 2018
Cancun, Mexico,
(Web site)
・
1st Joint ISTDM / ICSI 2018 Conf.,
9th Int. SiGe Technology and Device Meeting (ISTDM) and
11th Int. Conf. on Silicon Epitaxy and Heterostructures (ICSI),
May 27-31, 2018
Seminaris Seehotel Potsdam, Germany,
(Web site)
・
11th Int. WorkShop on New
Group IV Semiconductor Nanoelectronics,
Feb. 23-24, 2018
Sendai, Japan,
(Web site)
・
Symp. G03: Semiconductor Process Integration 10,
232th Meeting of the Electrochem. Soc.,
Oct. 1-5, 2017,
National
Harbor, MD, USA,
(Web site)
・
10th Int. Conf. on Silicon Epitaxy and
Heterostructures (ICSI-10),
May 14-19, 2017
Univ. Warwick, Coventry, UK,
(Web site)
・
10th Int. WorkShop on
New Group IV Semiconductor
Nanoelectronics and
JSPS Core-to-Core Program Joint
Seminar
"Atomically Controlled Processing for
Ultralarge Scale Integration",
Feb. 13-14, 2017
Sendai, Japan,
(Web site)
・
Symp. G05: SiGe,
Ge, and Related Compounds: Materials, Processing, and Devices 7,
Pacific Rim Meeting (PRiME 2016)
on Electrochem. and Solid-State Sci.,
Oct. 2-7, 2016
Hawaii, USA,
(Web site)
・
8th Int. SiGe Technology and Device Meeting
(ISTDM2016),
7th Int. Symp. on Control of Semiconductor Interfaces
(ISCSI-VII),
Jun. 7-11, 2016
Nagoya, Japan,
(Web site)
・
9th Int. WorkShop on New
Group IV Semiconductor Nanoelectronics and
JSPS Core-to-Core Program Joint
Seminar
"Atomically Controlled Processing for
Ultralarge Scale Integration",
Jan. 11-12, 2016
Sendai, Japan,
(Web
site)
・
Symp. G04: ULSI Process Integration 9, 228th Meeting
of the Electrochem. Soc.,
Oct. 11-16, 2015
Phoenix, AZ, USA,
(Web
site)
・
9th Int. Conf. on Silicon Epitaxy and Heterostructures
(ICSI-9),
May 17-22, 2015
Montreal, Canada,
(Web site)
・
8th Int. WorkShop on New
Group IV Semiconductor Nanoelectronics and
JSPS Core-to-Core Program Joint
Seminar
"Atomically Controlled Processing for
Ultralarge Scale Integration",
Jan. 29-30, 2015
Sendai, Japan,
(Web
site)
・
JSPS Core-to-Core Program Workshop
"Atomically Controlled Processing for Ultralarge Scale
Integration",
Nov. 13-14, 2014
Leuven, Belgium,
(Web
site)
・
Symp. P7:
SiGe, Ge, and Related Compounds:
Materials, Processing, and Devices 6,
226th Meeting of the Electrochem.
Soc.,
Oct. 5-9, 2014
Cancun, Mexico,
(Web
site)
・
7th Int. SiGe Technology and Device Meeting
(ISTDM2014),
Jun. 2-4, 2014
Singapore,
Singapore,
(Web
site)
・
7th Int. WorkShop on New
Group IV Semiconductor Nanoelectronics and
JSPS Core-to-Core Program Joint
Seminar
"Atomically Controlled Processing for
Ultralarge Scale Integration",
Jan. 27-28, 2014
Sendai, Japan,
(Web
site)
・
Symp. E12: ULSI Process Integration 8, 224th Meeting
of the Electrochem. Soc.,
Oct. 28-30, 2013
San Francisco, USA,
(Web
site)
・
JSPS Core-to-Core Program Workshop
"Atomically Controlled Processing for Ultralarge Scale
Integration",
Oct. 24-25, 2013
Frankfurt (Oder), Germany,
(Web site)
・
JSPS Core-to-Core Program Seminar
"Atomically Controlled Processing for Ultralarge Scale
Integration",
Jun. 6, 2013
Fukuoka, Japan,
(Web
site)
・
8th Int. Conf. on Silicon Epitaxy and Heterostructures
(ICSI-8),
Jun. 2-5, 2013
6th Int. Symp. on Control of
Semiconductor Interfaces (ISCSI-VI),
Jun. 5-6, 2013
Fukuoka, Japan,
(Web
site)
・
6th Int. WorkShop on New
Group IV Semiconductor Nanoelectronics and
JSPS Core-to-Core Program Joint
Seminar
"Atomically Controlled Processing for
Ultralarge Scale Integration"
Feb. 22 - 23, 2013
Sendai, Japan,
(Web
site)
・
Symp. E17: SiGe,
Ge, and Related Compounds: Materials, Processing, and Devices 5,
222nd Meeting of the Electrochem.
Soc.,
Oct. 8-12, 2012
Hawaii, USA,
(Web
site)
・
6th Int. SiGe Technology and Device Meeting
(ISTDM2012),
Jun. 4-6, 2012
Berkeley, CA, USA,
(Web
site)
・